Screen Wash Lo
Screen Wash LO is a custom formulated blend of aromatic and oxygenated solvents with high solvency and fast evaporation rate.
Download Data Sheets
Download Data Sheets
Screen Wash LO is a custom formulated blend of aromatic and oxygenated solvents with high solvency and fast evaporation rate.
De-Ox II is a de-oxidizer that will remove tin, lead oxides as well as other oxides from contact surfaces minimizing resistance levels and restoring semiconductor test sockets to optimal performance. De-Ox II deoxidizes without “activating” the metal surface therefore subsequent re-growth of oxides is not altered. De-Ox II removes only oxides, and will not attack most metals, except zinc and aluminum. De-Ox II does not attack plastic surfaces in test sockets.
Provides additional antitarnish protection while removing fully aqueous liquid photoresists in spray or soak applications. DX STRIP BAT is also effective on aqueous dry film photoresists, and on a combination of liquid and dry film resists being stripped in the same process. It will generally break dry films into particles suitable for filtration. DX STRIP BAT has a low VOC content for reduced air emissions.
Provides an effective clean out of Cupric Etcher sumps along with manual removal of deposits on the etch chamber walls. CUPRIC ETCH EQUIPMENT CLEANER will dissolve Dry Film deposits built up between PM’s. CUPRIC ETCH EQUIPMENT CLEANER has a low VOC content for reduced air emissions.
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