Step Three Archives | RBP Chemical Technology

AntiFoam BB ™

A blended organic defoaming surfactant for use in reducing foam generated in spray equipment. ANTIFOAM BB is especially effective in solutions used for developing and stripping aqueous and semi-aqueous dry film photoresists. Effective at low temperatures of 80°-130° F.
Citrisump

An acidic equipment cleaner designed for use in developers and resist strippers. CITRISUMPis exceptionally effective on solder mask developer residues, carbonate residues, and hard water scale. Its organic acid formula is effective without generating noxious fumes.
Cupric Etching Equipment Cleaner

Provides an effective clean out of Cupric Etcher sumps along with manual removal of deposits on the etch chamber walls. CUPRIC ETCH EQUIPMENT CLEANER will dissolve Dry Film deposits built up between PM’s. CUPRIC ETCH EQUIPMENT CLEANER has a low VOC content for reduced air emissions.
Defoamer FE™

Defoamer FETM is a fully organic non-Silicone water-soluble defoamer that rinses readily and leaves no residue. It is designed for systems where clean rinsing is essential. It is odorfree and biodegradable. Defoamer FETM is ideal for defoaming developers or strippers of any type and will work at any pH.
E-clean DF

An acidic, solvent-based, soluble equipment cleaner designed for use on photoresist developers and strippers. E-cleanDF is exceptionally effective on dry film resists, antifoam residues, hard water scale and carbonate residues. It effectively cleans the residues inside nozzles and pipes.
Equipment Cleaner II™

Equipment Cleaner IITM removes water hardness, photoresist and soldermask scum and metal salt deposits from chemical processing equipment. Specifically developed for the Printed Circuit Board and Chemical Milling Industries, it will safely clean any spray equipment without damage to any metal or plastic. Equipment Cleaner IITM may be used at any temperature the equipment can safely handle, and may be reused until all the capacity is consumed. Equipment Cleaner IITM is a product that cleans: • Dry film developer residues • Dry film stripper residues • Solder stripper residues • Cleaner residues • Etcher residues (ammoniacal, or cupric) • Soldermask Developer residue • Tin Stripper Iron residue
Equipment Cleaner IV

EquipmentCleaner IV removes water hardness, photoresist scum and metal salt deposits from chemical processing equipment. Specifically developed for the printed circuit boardindustry it is very useful in spray equipment causing no damage to metal and plastic parts.Equipment Cleaner IV is odorless.
FoamFREE™ 940

A highly effective foam suppressant for aqueous developing and stripping of DuPont™ RISTON® photopolymer films. FoamFREE 940 is a stable product which efficiently disperses foam in low concentrations.
FoamFREE™ One

A silicone free, non-solvent based aqueous antifoam for primary image developers and strippers and solder mask developers. FoamFREE™ONE suppresses foaming at very low usage without leaving residue behind or in the machine. FoamFREE™ONE is for any manufacturer who needs to reduce antifoam usage to reduce process costs without the use of solvents
Sump Doctor™

A liquid concentrate designed to clean and condition resist developing and Resist Stripper machines. It has an increased capability to remove stubborn dye and antifoam residues, and other insoluble materials, along with residues from dry film photoresists and solder masks. A regular maintenance program using SUMP DOCTOR will insure maximum efficiency from equipment, consistent high quality product and minimal downtime.
Sump Pro

A non-chelating, acidic equipment cleaner designed for use in developers and resist strippers.
SUMP PRO is exceptionally effective on resist and antifoam residues, hard water scale, and
carbonate residues. It contains a penetrating ingredient to enhance its ability to remove
caked-on residues. Its organic acid formula is effective without generating noxious fumes,
and is non-chelating for easier waste treatment.
Tidy Sump

A liquid concentrate designed to clean and condition developing and resist stripping machines, and other equipment. TIDY SUMP will remove a variety of contaminants such as residues from dry film photoresists, soldermasks, and antifoams. A regular maintenance program using TIDY SUMPwill insure maximum efficiency from equipment, consistent high quality product and minimum down-time.
TidyLine™ EQ-100

A concentrated alkaline equipment cleaner designed to clean conveyorized processing equipment. TIDYLINE EQ-100 effectively removes such process foulants as dry film photoresist scum and stains, etchant residue, and hard water scale.