A powdered material that is mixed with water and sulfuric acid to make a mild etch solution for copper and copper alloys. The operating solution provides a bright, clean, uniformly etched copper surface on printed circuit boards. CIRCUTEK ME-515 operating solution is specially formulated to be used in place of a sulfuric/peroxide or sodium or ammonium persulfate etching solution. It is excellent for removing tarnish and oxidation from the copper surface, and can be used prior to electroless and electrolytic plating, after tab stripping.
When used prior to electrolytic plating as part of a pattern cleaning system, CIRCUTEK ME-515 cleans and etches copper surfaces. It aids in the removal of dry film binder residues that penetrate into the copper-clad surface of printed circuit boards.
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A liquid 45% potassium carbonate concentrate formulated to develop fully aqueous dry film photoresists and photoimageable solder masks. DX-45 NH contains a unique blend of ingredients to ensure straight sidewalls and will help clean the foot” of underdeveloped polymer. These same ingredients help keep the equipment clean
An acidic, solvent-based, soluble equipment cleaner designed for use on photoresist developers and strippers. E-cleanDF is exceptionally effective on dry film resists, antifoam residues, hard water scale and carbonate residues. It effectively cleans the residues inside nozzles and pipes.
FinClean CR is a final finish acid cleaner designed for spray application and developed for use with immersion silver, OSP and other finishes. It is characterized by a relatively strong acidity and reduced surface tension without foaming. Its formulation does not include chloride and chelators, is VOC–free and biodegradable.