Photoresist Strippers

Showing all 4 results

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    ADF-55

    Formulated to remove fully aqueous dry films and liquid resists in soak or spray
    applications. ADF-55 breaks dry films into particles suitable for filtration and has a low
    VOC content for reduced air emissions. ADF-55 contains special copper brightening and
    antitarnish agents that produce a bright, uniform copper surface for automatic optical
    inspection and better etching characteristics.

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    ADF-72

    A photoresist stripper formulated to remove a wide variety of fully aqueous photo resists in a spray application. ADF-72provides fast strip speeds and contains brightening and antitarnish agents for a uniform copper surface for automatic optical inspection and better etching characteristics. It produces filterable particles for extended bath life.

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    Dual Strip™ BAT

    Formulated to remove fully aqueous dry films and screen ink resists in soak or spray applications. DUAL STRIP will generally break dry films into particles suitable for filtration. DUAL STRIP has a low VOC content for reduced air emissions. DUAL STRIP BAT contains additional copper brightening and antitarnish agents that produce a bright, uniform copper surface for automatic optical inspection and better etching characteristics.

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    DX™ Strip BAT

    Provides additional antitarnish protection while removing fully aqueous liquid photoresists in spray or soak applications. DX STRIP BAT is also effective on aqueous dry film photoresists, and on a combination of liquid and dry film resists being stripped in the same process. It will generally break dry films into particles suitable for filtration. DX STRIP BAT has a low VOC content for reduced air emissions.