Magnum N-499 Peroxide
Magnum N-499 Peroxide is a stabilized 25% hydrogen peroxide solution. It is designed for use in preparation and replenishment of Magnum N-499.
Download Data Sheets
Download Data Sheets
Magnum N-499 Peroxide is a stabilized 25% hydrogen peroxide solution. It is designed for use in preparation and replenishment of Magnum N-499.
A one-part concentrate formulated to develop fully aqueous dry film photoresists and photoimageable solder masks. DX-45 PLUS’ highly concentrated formula is ideally suited for use in feed and bleed systems, resulting in less frequent additions than with more dilute carbonate solutions. Proprietary ingredients enhance loading, help keep equipment clean, and ensure straighter sidewalls, cleaning the foot” of underdeveloped resist. These features result in greater productivity and less down time. “” one-part concentrate formulated to develop fully aqueous dry film photoresists and photoimageable”
A liquid 45% potassium carbonate concentrate formulated to develop fully aqueous dry film photoresists and photoimageable solder masks. DX-45 HW contains a unique blend of ingredients to ensure straight sidewalls and will help clean the foot” of underdeveloped polymer. Furthermore
An acidic, solvent-based, soluble equipment cleaner designed for use on photoresist developers and strippers. E-cleanDF is exceptionally effective on dry film resists, antifoam residues, hard water scale and carbonate residues. It effectively cleans the residues inside nozzles and pipes.
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