AT-3000
AT-3000 is a concentrated antitarnish compound which prevents tarnishing of copper and
copper alloys. It reacts chemically with clean copper surfaces to form an invisible barrier
that resists handling and environmental effects. AT-3000 can be used after electroless
copper, prior to photoresist application, and in the SMOBC process. It also can be used as
an additive to photoresist stripping solutions to prevent copper oxidation. When used
following electroless copper deposition, AT-3000 enhances the adhesion of dry film
photoresists.
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